Search Results - "Goernitz, Scot"

Real- Time Lithography Registration, Exposure, and Focus Control -- A Framework for Success.

Authors: Janakiram, Mani Goernitz, Scot

Source: IEEE Transactions on Semiconductor Manufacturing. Nov2005, Vol. 18 Issue 4, p534-538. 5p.

Subjects: Semiconductor industry, Intel computers, Quality control, Motion control devices, Metrology, Manufacturing processes