Search Results - "Howson R"

Reactive filtered arc evaporation.

Authors: Mustapha, N. M. Howson, R. P.

Source: Vacuum; March 2001, Vol. 60 Issue 3, p361-368, 8p

Comparison of unbalanced magnetron sputtering and filtered arc evaporation for the preparation of films onto insulating substrates.

Authors: Mustapha, N. Howson, R. P.

Source: Vacuum; February 1998, Vol. 49 Issue 2, p75-79, 5p

Composite metal/C:H films prepared in an unbalanced magnetron.

Authors: Biederman, H. Howson, R. P. Slavinská, D.

Source: Vacuum; October 1997, Vol. 48, p883-886, 4p

Reactive ion-plating at low ion energies with an unbalanced magnetron.

Authors: Howson, R. P. Ja'fer, H. A. Spencer, A. G.

Source: Vacuum; March-April 1993, Vol. 44, p191-195, 5p

The reactive sputtering of thin films of TiN at low target voltages.

Authors: Swady, R. A. Ja'fer, H. A. Howson, R. P.

Source: Vacuum; March-April 1993, Vol. 44, p297-301, 5p

Reactive unbalanced magnetron sputtering of hydrogenated amorphous silicon and silicon oxide.

Authors: Hall, G. W. Howson, R. P. Chew, A.

Source: Vacuum; March-April 1993, Vol. 44, p227-230, 4p

The design and performance of planar magnetron sputtering cathodes.

Authors: Spencer, A. G. Bishop, C. A. Howson, R. P.

Source: Vacuum; 1987, Vol. 37 Issue 3-4, p363-366, 4p

Optical coatings for large area interference filters.

Authors: Lewin, R. Howson, R. P. Bishop, C. A.

Source: Vacuum; 1987, Vol. 37 Issue 3-4, p257-260, 4p

Interface structure between reactively ion plated TiO2 films and PET substrate.

Authors: Suzuki, K. Christie, A. B. Howson, R. P.

Source: Vacuum; June 1986, Vol. 36, p323-328, 6p

Transparent conducting oxides of metals and alloys made by reactive magnetron sputtering from elemental targets.

Authors: Lewin, R. Howson, R. P. Bishop, C. A.

Source: Vacuum; January-March 1986, Vol. 36, p95-98, 4p

Surface damage of PET sheet in rf bias ion plating.

Authors: Suzuki, K. Christie, A. B. Howson, R. P.

Source: Vacuum; January-February 1984, Vol. 34, p181-187, 7p

Reactive ion plating of TiO2.

Authors: Howson, R. P. Suzuki, K. Bishop, C. A.

Source: Vacuum; January-February 1984, Vol. 34, p291-294, 4p

Plasma reflection edge in thin films of semiconductors.

Authors: Howson, R. P.

Source: Journal of Physics: D Applied Physics; June 1970, Vol. 3, p863-870, 8p

Related optical and electrical properties of thin films of indium arsenide.

Authors: Howson, R. P. Malina, V.

Source: Journal of Physics: D Applied Physics; June 1970, Vol. 3, p854-862, 9p

Getter evaporation of pure thin films of indium antimonide.

Authors: Howson, R. P. Malina, V.

Source: Journal of Physics: D Applied Physics; June 1970, Vol. 3, p871-876, 6p

Wideband data service.

Authors: Bender, E. C. Howson, R. D.

Source: Bell System Technical Journal; February 1971, Vol. 50, p667-681, 15p

Some thermal considerations on the use of solar cells in space vehicles.

Authors: Howson, R. P.

Source: Journal of the British Institution of Radio Engineers; December 1961, Vol. 22, p519-525, 7p

Optical properties of thin films of indium arsenide.

Authors: Howson, R. P.

Source: British Journal of Applied Physics; January 1968, p15-23, 9p

Analysis of the capabilities of polybinary data transmission.

Authors: Howson, R. D.

Source: IEEE Transactions on Communication Technology; September 1965, Vol. 13, p312-319, 8p

A low-voltage, high-current, ion-bombardment source using magnetron principles.

Authors: Ja'fer, H. A. Howson, R. P.

Source: Vacuum; March-April 1993, Vol. 44, p381-383, 3p