Search Results - "Lithography techniques"

Wide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation.

Authors: Lee, Mane-Si Laure Cholet, Julie Delboulbé, Anne et al.

Source: EPJ Web of Conferences. 11/20/2021, Vol. 255, p1-4. 4p.

A rasterization method for generating exposure pattern images with optical maskless lithography.

Authors: Lee, Jinwon Lee, Hyungku Yang, Jeongsam

Source: Journal of Mechanical Science & Technology. May2018, Vol. 32 Issue 5, p2209-2218. 10p.

Subjects: Lithography techniques, Electronics, Photoresist materials, Printed circuit design, Pixel density measurement

Effect of the Fabrication Parameters of the Nanosphere Lithography Method on the Properties of the Deposited Au-Ag Nanoparticle Arrays.

Authors: Jing Liu Chaoyang Chen Guangsong Yang et al.

Source: Materials (1996-1944). Apr2017, Vol. 10 Issue 4, p381. 15p. 7 Black and White Photographs, 4 Diagrams, 1 Chart.

Subjects: Lithography techniques, Fabrication (Manufacturing), Nanoparticles analysis, Surface plasmon resonance, Nanoelectromechanical systems

Lithography's long journey.

Authors: Miller, Chris

Source: MIT Technology Review; Jul/Aug2023, Vol. 126 Issue 4, p76-82, 5p, 2 Color Photographs, 2 Black and White Photographs

Additive manufacturing as new standard in microfabrication.

Authors: STUMPP, BARBARA bstumpp@gmx.de

Source: Industrial Laser Solutions for Manufacturing. Dec2015, Vol. 30 Issue 6, p31-34. 4p.

Subjects: Lithography techniques, Photonics, Polymerization, Three-dimensional printing, Medicine

Plasmonic Nanolithography: A Review.

Authors: Zhihua Xie Weixing Yu Taisheng Wang et al.

Source: Plasmonics. Sep2011, Vol. 6 Issue 3, p565-580. 16p. 2 Color Photographs, 4 Black and White Photographs, 11 Diagrams, 1 Graph.

Subjects: Lithography techniques, Surface plasmon resonance, Polaritons, Nanoparticles, Electron beam lithography

Rationally Designed Complex, Hierarchical Microarchitectures.

Authors: Noorduin, Wim L. Grinthal, Alison Mahadevan, L. et al.

Source: Science (pre-March 2025). 5/17/2013, Vol. 340 Issue 6134, p832-837. 6p.

Subjects: Molecular self-assembly, Nanostructures, Microstructure, Solution (Chemistry), Reaction-diffusion equations, Lithography techniques

Designing Responsive Buckled Surfaces by Halftone Gel Lithography.

Authors: Jungwook Kim Hanna, James A. Myunghwan Byun et al.

Source: Science (pre-March 2025). 3/9/2012, Vol. 335 Issue 6073, p1201-1205. 5p.

Subjects: Materials science, Polymer films, Halftone process, Lithography techniques, Surfaces (Technology), Crosslinking (Polymerization)

THE USE OF SOFT-LITHOGRAPHY TECHNIQUE ASSOCIATED WITH SEMICONDUCTOR LIGHT SOURCE FOR THE NEW OPTICAL DESIGN.

Authors: Chang, W. C. Yarn, K. F. Chuang, W. C.

Source: Digest Journal of Nanomaterials & Biostructures (DJNB). Jun2010, Vol. 5 Issue 2, p433-439. 7p. 1 Color Photograph, 5 Diagrams, 1 Graph.

Effect Of The Powder Size Distribution On The Lithography-Based Metal Manufacturing Process.

Authors: Cano, Santiago Cano Bosters, Johannes Sperling, Clemens et al.

Source: Proceedings of the European Congress & Exhibition on Powder Metallurgy; 2024, p732-737, 6p

Recent advances of Lithography-based Metal Manufacturing of copper.

Authors: Cano, Santiago Cano Peritsch, Paul Bosters, Johannes et al.

Source: Proceedings of the European Congress & Exhibition on Powder Metallurgy; 2024, p697-703, 7p

Characterisation of Microstructure and Mechanical Properties of 17-4PH Parts Produced with the Lithography-based Metal Manufacturing Technology.

Authors: Vogel, Lucas Khan, Qaiser Ali Baum, Andreas et al.

Source: Proceedings of the European Congress & Exhibition on Powder Metallurgy; 2024, p369-375, 7p

Photomask-optimization model reduces effects of optical aberrations.

Authors: Wallace, John

Source: Laser Focus World. Apr2011, Vol. 47 Issue 4, p26-28. 3p.

Subjects: Lithography techniques, Optical aberrations, Photolithography, Technological innovations, University of Hong Kong

Geographic Terms: Hong Kong (China), China

Fabrication of periodic nanostructures using dynamic plowing lithography with the tip of an atomic force microscope.

Authors: He, Yang Yan, Yongda Geng, Yanquan et al.

Source: Applied Surface Science. Jan2018 Part A, Vol. 427, p1076-1083. 8p.

Subjects: Nanostructures, Lithography techniques, Atomic force microscopes, Cantilevers, Raman scattering

Numerical and experimental study of passive fluids mixing in micro-channels of different configurations.

Authors: Das, Sankha Tilekar, Shivkant Wangikar, Sandeep et al.

Source: Microsystem Technologies. Dec2017, Vol. 23 Issue 12, p5977-5988. 12p.

Subjects: Lithography techniques, Serpentine, Microchannel flow, Optical fiber fabrication, Numerical analysis

Illumination system with freeform fly's eye to generate pixelated pupil prescribed by source-mask optimization in extreme ultraviolet lithography.

Authors: Jiahua Jiang Qiuli Mei Yanqiu Li et al.

Source: Optical Engineering. Jun2017, Vol. 56 Issue 6, p1-5. 5p.

Subjects: Ultraviolet lithography, Lithography techniques

Lithography-Based Ceramic Manufacturing.

Authors: Allan, Shawn Schneider, Peter Bomze, Daniel et al.

Source: Ceramic Industry. May2017, Vol. 167 Issue 5, p16-19. 4p.

Subjects: Three-dimensional printing, Lithography techniques, Self-folding structures & materials, Ceramics, Casting (Manufacturing process)

Cut Mask Optimization With Wire Planning in Self-Aligned Multiple Patterning Full-Chip Routing.

Authors: Shao-Yun Fang Kuo-Hao Wu

Source: IEEE Transactions on Very Large Scale Integration (VLSI) Systems. Feb2017, Vol. 25 Issue 2, p581-593. 13p.

Subjects: Lithography techniques, Routing algorithms, Structural optimization

Particle Free Handling of Substrates.

Authors: Samadi, Hassan Pfeffer, Markus Altmann, Roswitha et al.

Source: IEEE Transactions on Semiconductor Manufacturing. Nov2016, Vol. 29 Issue 4, p314-319. 6p.

Subjects: Semiconductor technology, Lithography techniques, Assembly line methods, Materials handling, Semiconductor wafers, Integrated circuits

Nondestructive analysis of lithographic patterns with natural line edge roughness from Mueller matrix ellipsometric data.

Authors: Chen, Xiuguo Shi, Yating Jiang, Hao et al.

Source: Applied Surface Science. Dec2016 Part A, Vol. 388, p524-530. 7p.

Subjects: Nondestructive testing, Lithography techniques, Surface roughness, Mueller calculus, Ellipsometry, Scanning electron microscopy