Search Results - "Microlithography"

Direct resist-free patterning of an organic semiconductor via thermal scanning probe lithography.

Authors: Luo, Kaimin Li, Jun Gu, Yanshu et al.

Source: Discover Nano; 6/21/2026, Vol. 21 Issue 1, p1-11, 11p

High Resolution Imaging Using Micro-Objectives Fabricated by 2-Photon-Polymerization.

Authors: Thiemicke, Fabian Agour, Mostafa Bergmann, Ralf B. et al.

Source: Applied Sciences (2076-3417); Aug2025, Vol. 15 Issue 15, p8756, 12p

Recent Progress of Nonchemically‐Amplified Resists for High‐Resolution Lithography†.

Authors: Li, Hao Peng, Rongrong Liu, Zhuoran et al.

Source: Chinese Journal of Chemistry; Jul2026, Vol. 44 Issue 13, p2175-2201, 27p

Patterning of Photoresist‐Compatible Perovskite Quantum Dots for High‐Definition Displays.

Authors: Wang, Haoyu Luo, Chengzhao Ding, Yanhui et al.

Source: Laser & Photonics Reviews; 6/18/2026, Vol. 20 Issue 12, p1-10, 10p

Lithography Alignment Technologies: A Comprehensive Review of Advances and Challenges.

Authors: Xu, Feifan Zhang, Jin Li, Weishi et al.

Source: Laser & Photonics Reviews; 6/5/2026, Vol. 20 Issue 11, p1-46, 46p

Ultrafast Laser Two‐Photon Lithography for Metasurface Engineering: Advances in Fabrication and Photonic Applications.

Authors: Eisa, Mohamed Hassan Zia, Ali Hassan, Zainuriah et al.

Source: Laser & Photonics Reviews; 6/5/2026, Vol. 20 Issue 11, p1-62, 62p

Design of Multicarboxylated Phenolic Resin Functionalized With Cinnamic Acid for Quantum Dots Photolithography.

Authors: Yue, Wenhui Tong, Bin Yang, Gaoling et al.

Source: ChemNanoMat; Jun2026, Vol. 12 Issue 6, p1-7, 7p

Tert‐Butyl–Engineered Trinuclear Tin Complexes for High‐Sensitivity Sub‐10 Nm Patterning.

Authors: Gong, Xiaofeng Cong, Riyao Huang, Xinyan et al.

Source: Advanced Functional Materials; May2026, Vol. 36 Issue 39, p1-13, 13p

Multiscale Structuring of Hydroxyapatite via Two‐Photon Lithography of Nanocomposites.

Authors: Hambitzer, Leonhard Hornbostel, Jan Mathis Prediger, Richard et al.

Source: Advanced Functional Materials; 5/4/2026, Vol. 36 Issue 36, p1-13, 13p

Optimizing photoresist linewidth roughness in ion beam shaping: A systematic study of stage angular configuration.

Authors: Wu, Xiaojian Dong, Shuo Xu, Kaidong et al.

Source: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; May2026, Vol. 44 Issue 3, p1-12, 12p

Study on the imaging of bright-field and dark-field for contact holes in extreme ultraviolet lithography considering stage vibration effects.

Authors: Shen, Hao Zhang, Libin Wang, Jiashuo et al.

Source: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; May2026, Vol. 44 Issue 3, p1-10, 10p

Fabrication optimization of suspended stencil mask lithography for multi-terminal Josephson junctions.

Authors: Teller, Justus Jalil, Abdur Rehman Lentz, Florian et al.

Source: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; May2026, Vol. 44 Issue 3, p1-7, 7p

From chips to kilowatts: The supply chain behind an 'AI cluster': Data centers' thirst for power, cooling infrastructure strains resources.

Authors: Jhaveri, Shilen

Source: ISE: Industrial & Systems Engineering at Work; May2026, Vol. 58 Issue 5, p30-32, 3p

3D Data Encryption and Random‐Featured Anti‑Counterfeiting Enabled by Single‐Step Grayscale Lithographic Quantum‐Dot Patterns.

Authors: Chen, Yu Cai, Junhu Lai, Wenzong et al.

Source: Advanced Functional Materials; Apr2026, Vol. 36 Issue 34, p1-11, 11p

Positive‐Tone Nanolithography of Antimony Trisulfide with Femtosecond Laser Wet‐Etching.

Authors: Dey, Abhrodeep Hübner, Uwe Benardais, Albane et al.

Source: Advanced Functional Materials; 4/16/2026, Vol. 36 Issue 31, p1-11, 11p

Tri‐Layer Solid‐State Nanopore Arrays with Crosstalk Suppression for High‐Throughput, Femtomolar‐Level Biosensing.

Authors: Feng, Silu Luo, Qinglong Ai, Siqi et al.

Source: Advanced Science; 4/9/2026, Vol. 13 Issue 20, p1-14, 14p

Nano calligraphy via optical electro-aligning manipulation.

Authors: Liu, Haobing Fu, Rongxin Guo, Zongliang et al.

Source: Microsystems & Nanoengineering; 4/8/2026, Vol. 12 Issue 1, p1-13, 13p

Volume‐Controlled Selective‐Dispensation‐Based Mixing of Multiple Solutions Using the Droplet Array Sandwiching Technology†.

Authors: Miyata, Yoshinori Bono, Shinji Konishi, Satoshi

Source: IEEJ Transactions on Electrical & Electronic Engineering; Apr2026, Vol. 21 Issue 4, p607-612, 6p

Review on Superconducting Metamaterials: Modeling, Fabrication, and Applications in Quantum and RF Systems.

Authors: Telezing, Boris Joel Kenne Liu, Jinxing

Source: Journal of Electronic Materials; Mar2026, Vol. 55 Issue 3, p2511-2537, 27p

Photocrosslinker‐Based Direct Microlithography for Organic Electronic Devices: From Patterning Capability to Multifunctionality.

Authors: Zhang, Jingling Zhong, Yueheng Wang, Xiangyu et al.

Source: Advanced Materials Technologies; Mar2026, Vol. 11 Issue 5, p1-26, 26p