Search Results - "Reactive sputtering"

Tailoring structural and optical properties of Si-doped HfO2 thin films via target composition and plasma environment.

Alternate Title: Вплив хімічного складу мішені та газової плазми на оптичні та структурні характеристики плівок HfO2, легованих кремнієм.

Authors: Khomenkov, D. V. Ponomaryov, S. S. Portier, X. et al.

Source: Semiconductor Physics, Quantum Electronics & Optoelectronics. 2025, Vol. 28 Issue 4, p441-448. 8p.

Subjects: Refractive index, Reactive sputtering, Magnetron sputtering, Thin films, Glass coatings, Optical properties, Plasma deposition, Microstructure

Catalyst-free growth of graphene on Si substrate using reactive pulsed sputtering.

Authors: Oishi, Yuto Iwata, Akihiro Shinohara, Masanori et al.

Source: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films. Jul2026, Vol. 44 Issue 4, p1-8. 8p.

Subjects: Graphene, Reactive sputtering, Substrates (Materials science), Carbon nanomaterials, Carbon-based materials

Optimization of deposition parameters for silicon dioxide thin films synthesized by reactive pulsed-direct current magnetron sputtering.

Authors: Cruz-Gabarain, L Abundiz-Cisneros, N Sanginés, R et al.

Source: Journal of Physics D: Applied Physics. 2026, Vol. 59 Issue 20, p1-14. 14p.

Subjects: Magnetron sputtering, Reactive sputtering, Current-voltage characteristics, Silica films, Refractive index, Emission spectroscopy, Optical spectroscopy

Large Area High‐Performance Thin Film Solid Oxide Fuel Cell with Nanoscale Anode Functional Layer by Scalable Reactive Sputtering.

Authors: Ju, Kyoungjae Oh, Seongkook Lee, Jong Hyuk et al.

Source: Advanced Science. 8/7/2025, Vol. 12 Issue 29, p1-10. 10p.

Structure and inconel 718 cutting of (TiW)N films prepared by reactive sputtering.

Authors: Shen, Yu-Kai Chang, Tien-Li Wu, Shu-Ping et al.

Source: International Journal of Advanced Manufacturing Technology. Apr2026, Vol. 143 Issue 7/8, p4093-4107. 15p.

Subjects: Cutting (Materials), Reactive sputtering, Thin film crystallography, Ceramic coating, Milling-machines, Corrosion resistance, Heat treatment, Mechanical behavior of materials

Understanding hysteresis‐free reactive DC magnetron and high target utilization sputtering of TiZrHfVNbTa‐N coatings.

Authors: Lofaj, František Fekete, Matej Kvetková, Lenka et al.

Source: International Journal of Applied Ceramic Technology. Feb2026, Vol. 23 Issue 1, p1-12. 12p.

Subjects: Reactive sputtering, Hysteresis, Protective coatings, Magnetron sputtering

Large Built‐in Fields and Tunable Ferroelectricity in Composition‐Graded ScAlN Thin Films Deposited by Reactive Sputtering.

Authors: Nguyen, Tai Ghosh, Anirban Dao, Thang Duy et al.

Source: Advanced Science. 6/20/2025, Vol. 12 Issue 23, p1-10. 10p.

Substrate Bias-Driven Structural and Mechanical Evolution of AlCrN and AlCrSiN Coatings via Reactive Magnetron Sputtering.

Authors: Tsai, Du-Cheng Huang, Rong-Hsin Chang, Zue-Chin et al.

Source: Materials (1996-1944). Apr2025, Vol. 18 Issue 7, p1671. 19p.

Subjects: Substrates (Materials science), Reactive sputtering, Magnetron sputtering, Radio frequency, Grain refinement

Advances in Enhancing the Wear Performance of Ti-6Al-4V Biomedical Alloy Through Nb 2 O 5 Coating.

Authors: Ferreira, Murilo Oliveira Alves Wolf, Witor Gelamo, Rogério Valentim et al.

Source: Materials (1996-1944). Apr2025, Vol. 18 Issue 7, p1593. 20p.

Subjects: Orthopedic implants, Reactive sputtering, Artificial implants, Artificial saliva, Niobium oxide

Effect of Annealing in Air on the Structural and Optical Properties and Efficiency Improvement of TiO 2 /Cu x O Solar Cells Obtained via Direct-Current Reactive Magnetron Sputtering.

Authors: Wisz, Grzegorz Sibiński, Maciej Łabuz, Mirosław et al.

Source: Materials (1996-1944). Feb2025, Vol. 18 Issue 4, p888. 16p.

Subjects: Solar cell efficiency, Reactive sputtering, Reflectance, Magnetron sputtering, Buffer layers

Reactive Sputtering of SiCN Films: Process Optimization and Bonding Behavior for Cu Hybrid Bonding.

Authors: Choi, Junyoung Jang, Suin Kim, Sarah Eunkyung

Source: Journal of Electronic Materials. Jan2026, Vol. 55 Issue 1, p1222-1233. 12p.

Subjects: Reactive sputtering, Interfacial bonding, Silicon nitride films, Permittivity, Process optimization, Semiconductor devices

Thermal Stability of Nanocrystalline Ag–Cu–Al Alloy Films with Densely Dispersed Alumina Particles Prepared via Reactive Sputtering Using Ar–O2 Mixed Gas.

Authors: Ueshima, Yoshiyuki Hasegawa, Masakatsu Kubota, Naoyoshi et al.

Source: Metallurgical & Materials Transactions. Part A. Jul2024, Vol. 55 Issue 7, p2264-2281. 18p.

Subjects: Reactive sputtering, Thermal stability, Flux pinning, Thin films, Ostwald ripening, Young's modulus, Heat resistant alloys, Silver

Performance Improvement of a-In-Ga-Sn-O Thin-Film Transistor with Oxygen Doping by Reactive Sputtering Method.

Authors: Liao, Tsung-I Chang, Sheng-Po Shi, Wen-Xiang et al.

Source: Journal of Electronic Materials. Jun2024, Vol. 53 Issue 6, p3063-3069. 7p.

Subjects: Reactive sputtering, Reactive oxygen species, Indium tin oxide, Transistors, Charge carrier mobility, Thin films, Oxygen

Effect of MoN on the structure and characteristics of MoN/ZrMoN bi-layer nitride films.

Authors: Hu, Ding-Chiang Kuo, Dong-Hau Tsao, Chung-Chen et al.

Source: Bulletin of Materials Science. Jun2024, Vol. 47 Issue 2, p1-10. 10p.

Subjects: Buffer layers, Reactive sputtering, Hardness, Adhesives

Oxidation Performance of Nano-Layered (AlTiZrHfTa)N x /SiN x Coatings Deposited by Reactive Magnetron Sputtering.

Authors: Touaibia, Djallel Eddine Achache, Sofiane Bouissil, Abdelhakim et al.

Source: Materials (1996-1944). Jun2024, Vol. 17 Issue 12, p2799. 21p.

Subjects: Reactive sputtering, Magnetron sputtering, Refractory coating, DC sputtering, Field emission electron microscopy

Growth of TiSiN Films by Room-Temperature Reactive Magnetron Sputtering.

Authors: Sulyaeva, V. S. Syrokvashin, M. M. Kozhevnikov, A. K. et al.

Source: Inorganic Materials. Jun2024, Vol. 60 Issue 6, p723-730. 8p.

Subjects: Titanium nitride, Reactive sputtering, Silicon nitride, X-ray photoelectron spectroscopy, Magnetron sputtering

Gas pressure dependence of optical and mechanical properties in a SiCO thin film for optical waveguide by reactive sputtering method.

Authors: Nikkuni, Hiroyuki Ito, Hiroshi Takatsuka, Yu

Source: Electronics & Communications in Japan. Mar2024, Vol. 107 Issue 1, p1-6. 6p.

Subjects: Optical films, Reactive sputtering, Thin films, Young's modulus, Optical properties, Nanomechanics, Waveguides

Compositional Optimization of Sputtered WO 3 /MoO 3 Films for High Coloration Efficiency.

Authors: Lábadi, Zoltán Takács, Dániel Zolnai, Zsolt et al.

Source: Materials (1996-1944). Mar2024, Vol. 17 Issue 5, p1000. 13p.

Subjects: Reactive sputtering, Magnetron sputtering, Oxide coating, Thin films, Combinatorial chemistry, Propylene carbonate

Synthesis and study of photoelectrochromic and photocatalytic behavior of double-layer N-doped TiO2/Co3O4 configuration via DC reactive magnetron sputtering.

Authors: Kadhim, Firas J. Hashim, Noor Alhuda H. Abdulsattar, Zinah S.

Source: Optical & Quantum Electronics. Feb2024, Vol. 56 Issue 2, p1-10. 10p.

Subjects: Reactive sputtering, Magnetron sputtering, Doping agents (Chemistry), Zinc oxide films, Field emission electron microscopy, Optical modulation, Thin films

NO2 gas sensing performance of Ag−WO3−x thin films prepared by reactive magnetron sputtering process.

Authors: Hossain, Modassar Sarkar, Krishnendu Mondal, Arnab et al.

Source: Applied Physics A: Materials Science & Processing. Dec2023, Vol. 129 Issue 12, p1-13. 13p.

Subjects: Magnetron sputtering, Reactive sputtering, Thin films, Magnetrons, X-ray photoelectron spectroscopy, Transmission electron microscopes, Trace gases