Search Results - "Sputtering (Physics)"

A New Paradigm of Magnetron Target Design.

Authors: Shapovalov, Viktor I. Sharkovskii, Daniil S. Zephaniah, Joshua K. et al.

Source: Nanomaterials (2079-4991). May2026, Vol. 16 Issue 9, p543. 17p.

Subjects: Magnetron sputtering, Sputtering (Physics), High-entropy alloys, Metallic thin films, Nanostructured materials

LaSrCoFeO 3 Thin Films Deposited by Sputtering for Battery Electrodes.

Authors: Vidal, Jorge Biangue Telfah, Ahmad Costa, Carlos et al.

Source: Coatings (2079-6412); Mar2026, Vol. 16 Issue 3, p287, 13p

Ni Thick Films with Compact Structure and Strong Adhesion Prepared with H 2 -Assitant RF Magnetron Sputtering at High Deposition Rate.

Authors: Bilal, Umar Li, Yangping Rana, Fizza et al.

Source: Coatings (2079-6412); Mar2026, Vol. 16 Issue 3, p279, 18p

Microstructure and Soft Magnetic Properties of an FeGaYCo Film.

Authors: Deng, Haohao Zhu, Zhibin Zhao, Zihao et al.

Source: Coatings (2079-6412); Jan2026, Vol. 16 Issue 1, p77, 14p

Machine Learning-Based Modeling and Multi-Objective Optimization of Magnetron-Sputtered Platinum Coatings.

Authors: Kljajo, Matej Čatipović, Nikša Peko, Ivan et al.

Source: Coatings (2079-6412); Jan2026, Vol. 16 Issue 1, p8, 16p

Influence of Deposition Temperature on the Mechanical and Tribological Properties of Cr/Ni Co-Doped Diamond-like Carbon Films.

Authors: Zhairabany, Hassan Khaksar, Hesam Vanags, Edgars et al.

Source: Crystals (2073-4352); Jan2026, Vol. 16 Issue 1, p52, 23p

Preparation and Properties of Plasma Etching-Resistant Y 2 O 3 Films.

Authors: Zhang, Rui Peng, Jiaxing Zhang, Xiaobo et al.

Source: Coatings (2079-6412); Dec2025, Vol. 15 Issue 12, p1397, 21p

Biological Response and Antimicrobial Behaviour of Sputtered TiO 2 /Cu Coatings Deposited on Ti6Al4V Alloy.

Authors: Nikolova, Maria P. Handzhiyski, Yordan Dimitrova, Tanya V. et al.

Source: Coatings (2079-6412); Nov2025, Vol. 15 Issue 11, p1341, 18p

Raman Spectral Analysis of Sputtered and Sulfurized Nanostructured WS 2 Films.

Authors: Kadlečíková, Magdaléna Hotový, Ivan Kumar, Naman et al.

Source: Crystals (2073-4352); Nov2025, Vol. 15 Issue 11, p955, 12p

Development of an atomic layer etching process for diamond substrates.

Authors: Régnier, Marine Kasprzak, Jacek Dydniański, Amadeusz et al.

Source: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films. May2026, Vol. 44 Issue 3, p1-8. 8p.

Subjects: Plasma etching, Sputtering (Physics), Diamond surfaces, Electron beam lithography, Surface preparation, Photonic crystals

Fabrication of Low-Resistance Ru Films by Sputtering in Ar or Kr and Gas Backscattering Behavior.

Authors: Yokoyama, Yamato Kawamura, Midori Kiba, Takayuki

Source: Journal of Electronic Materials. Jun2026, Vol. 55 Issue 6, p4926-4931. 6p.

Subjects: Sputtering (Physics), Backscattering, Krypton, Computer simulation, Thin films, Thin film devices, Electrical resistivity, Argon

Precision-Tuned Magnetron Sputtering for High-Performance Metallized Copper Films.

Authors: Yang, Ying Hao, Xiaoyu Zhang, Liuyan et al.

Source: Coatings (2079-6412); Sep2025, Vol. 15 Issue 9, p1089, 14p

A Study of HiPIMS Process Characteristics in SiO 2 Deposition.

Authors: Gajdics, Marcell Olasz, Dániel Sáfrán, György et al.

Source: Coatings (2079-6412); Sep2025, Vol. 15 Issue 9, p1023, 13p

Numerical and Experimental Study on Deposition Mechanism of Laser-Assisted Plasma-Sprayed Y 2 O 3 Coating.

Authors: Zou, Hui Zhao, Xutao Fu, Bin et al.

Source: Coatings (2079-6412); Aug2025, Vol. 15 Issue 8, p904, 17p

Transforming Device Efficiency and Stability in NiO‐Sputtered n–i–p Perovskite Solar Cells by Soft‐Landing and a Thin Spiro‐OMeTAD Buffer Layer.

Authors: Basak, Susmita Sharma, Rajat Pariari, Debasmita et al.

Source: Advanced Energy Materials. 4/22/2026, Vol. 16 Issue 16, p1-12. 12p.

Subject Terms: *Nickel oxide, *Sputtering (Physics), *Durability, *Solar cells, *Inorganic chemistry, *Solar cell efficiency

Molecular Dynamics Simulation of Sputtering of Monocrystalline Silicon: Optimization of Thermostating Parameters.

Authors: Nazarov, A. A. Yunin, P. A. Mikhailenko, M. S. et al.

Source: Russian Microelectronics. Feb2026, Vol. 55 Issue 1, p123-127. 5p.

Subjects: Sputtering (Physics), Silicon crystals, Thermostat, Canonical ensemble, Ion bombardment, Molecular dynamics, Particle emissions

Direct growth of gold nanoparticles-decorated CuO nanosheets on printed circuit boards for non-enzymatic glucose detection.

Authors: Nguyen, Canh Viet Vu, Van-Phu Tran, Luyen Thi et al.

Source: Journal of Materials Science; Jul2026, Vol. 61 Issue 27, p19572-19585, 14p

Dielectric substrates as defect sources in two-dimensional materials under ion irradiation.

Authors: Kolesov, E. A.¹ (AUTHOR) kolesovea@bsu.by

Source: Russian Physics Journal. Jul2026, p1-5. 5p.

Annealing-Induced Modifications in the Electrochemical Response of Sputtered Bi2O3 Films on 316L Stainless Steel.

Authors: Kumar, A. Madhan Yalambaku, Rajesh Suleiman, Rami K. et al.

Source: JOM: The Journal of The Minerals, Metals & Materials Society (TMS); Jul2026, Vol. 78 Issue 7, p7006-7019, 14p

In situ nitrogen doping enables highly stable InSnZnON thin-film transistors.

Authors: Liu, Tao Wang, Chunlan Zhou, Xin et al.

Source: Applied Physics Letters; 6/22/2026, Vol. 128 Issue 25, p1-7, 7p