Search Results - "X-ray reflectometry"

Microstructure analysis of low electron density contrast metallic multilayers using resonant X‐ray reflectivity.

Authors: Rao, P. N. Swami, M. K. Srivastava, H. et al.

Source: Journal of Synchrotron Radiation. May2026, Vol. 33 Issue 3, p708-714. 7p.

Subjects: X-ray reflectometry, Multilayered thin films, Electron density, Interfacial roughness, Microstructure, Thin films, Magnetron sputtering

High-Throughput Density Characterization of Combinatorial Thin Films Using X-ray Reflectivity.

Authors: Addamane, Sadhvikas J. Dorman, Kyle R. Desai, Saaketh et al.

Source: Journal of Electronic Materials. Apr2026, Vol. 55 Issue 4, p3902-3909. 8p.

Subjects: X-ray reflectometry, Thin films, Gold-platinum alloys, Nondestructive testing, Materials science

Nondestructive Metrology of SiO/SiN Multilayer Stack by X‐Ray Reflectometry and Comparison With TEM Results.

Authors: Liu, Naiming Wang, Yun‐Yu Chan, Sook Fun et al.

Source: Surface & Interface Analysis: SIA. Mar2026, Vol. 58 Issue 3, p176-185. 10p.

Subjects: X-ray reflectometry, Transmission electron microscopy, Quality control standards, Dielectric films, Silicon nitride films, Nondestructive testing, Thin films analysis

Comparison of Thin Film Thickness Determination Methods Based on X‐Ray Reflectivity.

Authors: Lishchenko, Natalia Morris, Michael Larshin, Vasily et al.

Source: Journal of Nanotechnology; 4/24/2026, Vol. 2026, p1-17, 17p

Some Basic Considerations on the Reflectance of Smooth Metal Surfaces: Fresnel's Formula and More.

Authors: Stenzel, Olaf Wilbrandt, Steffen

Source: Coatings (2079-6412); Feb2026, Vol. 16 Issue 2, p236, 38p

Prototype of 2D PSD for slow neutrons based on RPC with 10B4C film.

Authors: Petrova, M. O. Bogdzel', A. A. Bodnarchuk, V. I. et al.

Source: Instruments & Experimental Techniques. Dec2024, Vol. 67 Issue 6, p1080-1087. 8p.

Subjects: X-ray reflectometry, Physical sciences, Radiographic films, Gamma rays, Boron carbides

X-ray Diagnostics of Multilayer Ti/Ni Mirrors with Different Configurations of Si Buffer Layer Using X-ray Reflectometry and X-ray Standing Wave Methods.

Authors: Seregin, A. Yu. Volkovsky, Yu. A. Prosekov, P. A. et al.

Source: Crystallography Reports. Dec2025, Vol. 70 Issue 6, p872-877. 6p.

Subjects: X-ray reflectometry, Optical mirrors, Reflectometry, X-ray detection, Optical multilayers, Buffer layers

X‐ray reflectivity from micrometre‐scaled surfaces using nanobeams.

Authors: Vonk, Vedran Tober, Steffen Leake, Steven J. et al.

Source: Journal of Applied Crystallography. Dec2025, Vol. 58 Issue 6, p1978-1985. 8p.

Subjects: X-ray reflectometry, Grazing incidence, Nanoparticles, Surfaces (Physics), Data analysis, Trajectory measurements

Effects of layer boundaries on x-ray reflectivity in thermally treated ternary gate dielectrics grown by atomic layer deposition.

Authors: Lu, Jong-Hong Chu, Yen-Ho Chou, Liang-Pin et al.

Source: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films. Nov2025, Vol. 43 Issue 6, p1-11. 11p.

Subjects: X-ray reflectometry, Atomic layer deposition, Electric properties, Layer structure (Solids), Dielectric films, Interfaces (Physical sciences)

Chain-Melting Phase Transition in a Lamellar Film of Dimyristoyl-Phosphatidylserine on the Surface of a Silica Hydrosol.

Authors: Tikhonov, A. M. Volkov, Yu. O. Nuzhdin, A. D. et al.

Source: Crystallography Reports. Jun2024, Vol. 69 Issue 3, p365-373. 9p.

Subjects: Phase transitions, X-ray reflectometry, Transition temperature, Silica, Critical temperature

Semitransparent Organic Photovoltaic Devices: Interface/Bulk Properties and Stability Issues.

Authors: Paci, Barbara Righi Riva, Flavia Generosi, Amanda et al.

Source: Nanomaterials (2079-4991). Feb2024, Vol. 14 Issue 3, p269. 14p.

Subjects: X-ray reflectometry, Atomic force microscopy, Interface stability, Molybdenum oxides, Thin films

Concept of a Broadband Hettrick–Underwood Monochromator for an X-ray Reflectometer for the 6–27 nm Wavelength Range.

Authors: Kolesnikov, A. O. Vishnyakov, E. A. Logachev, M. D. et al.

Source: Bulletin of the Lebedev Physics Institute. 2025 Suppl 9, Vol. 52, pS937-S943. 7p.

Chemical–Mechanical Super-Polishing of Al 2 O 3 (0001) Wafer for Epitaxial Purposes.

Authors: Lee, Chih-Hao Lee, Chih-Hong

Source: Crystals (2073-4352); Aug2025, Vol. 15 Issue 8, p694, 10p

Portable X‐Ray Reflectometer for Thickness and Density Determination of Mono‐ and Multi‐Layer Thin Films.

Authors: Imashuku, Susumu Ohnishi, Tsunemasa Kawai, Jun

Source: XRS: X-ray Spectrometry. Sep/Oct2025, Vol. 54 Issue 5, p626-631. 6p.

X-ray Reflectometry of Thin Films Formed during Phase Separation of Organic Solutions of Aliphatic Polyethers in Water.

Authors: Asadchikov, V. E. Volkov, Y. O. Roshchin, B. S. et al.

Source: Crystallography Reports. Feb2023, Vol. 68 Issue 1, p104-109. 6p.

Subjects: X-ray reflectometry, Thin films, Phase separation, Polyethers, Polyester films, X-ray scattering

From Sparse Nanoparticles to Graded Interfaces: Beyond Classical Descriptions of LiF Growth on Organic Semiconductors.

Authors: Oliviera, Pedro Maye, Felix Turak, Ayse

Source: Chemistry - An Asian Journal; 6/26/2026, Vol. 21 Issue 12, p1-14, 14p

GenL: an extensible fitting program for Laue oscillations and whole‐pattern fitting.

Authors: Ravensburg, Anna L. Bylin, Johan Kapaklis, Vassilios et al.

Source: Journal of Applied Crystallography; Jun2026, Vol. 59 Issue 3, p968-977, 10p

Kinetic Regimes of Hydrogen Absorption in Thin Films.

Authors: Guasco, Laura Pütter, Sabine Khaydukov, Yury N. et al.

Source: Advanced Functional Materials; 6/1/2026, Vol. 36 Issue 44, p1-10, 10p

Poly(vinylidene fluoride‐co‐trifluoroethylene) Thin Films after Dip‐ and Spin‐Coating.

Authors: Apelt, Sabine Höhne, Susanne Mehner, Erik et al.

Source: Macromolecular Materials & Engineering. Oct2022, Vol. 307 Issue 10, p1-8. 8p.

Subjects: Thin films, X-ray reflectometry, Atomic force microscopy, Reflectance spectroscopy, Infrared absorption

Effect of Periodic Modulation of Tungsten Oxide Magnetron Deposition Angle upon the Obtained Layer Structure according to X-Ray Reflectometry Measurements.

Authors: Matveev, V. A. Eruzin, A. A. Semenova, A. A. et al.

Source: Glass Physics & Chemistry. Dec2021 Supplement, Vol. 47 Issue 1, pS63-S66. 4p.

Subjects: X-ray reflectometry, Tungsten oxides, Magnetron sputtering, Electrochromic effect, Electrochromic devices, Magnetrons, Electron density