He, W., Mauer, G., & Vaßen, R. (2017). Excitation Temperature and Constituent Concentration Profiles of the Plasma Jet Under Plasma Spray-PVD Conditions. Plasma Chemistry & Plasma Processing, 37(5), 1293. https://doi.org/10.1007/s11090-017-9832-8
Chicago Style (17th ed.) CitationHe, Wenting, Georg Mauer, and Robert Vaßen. "Excitation Temperature and Constituent Concentration Profiles of the Plasma Jet Under Plasma Spray-PVD Conditions." Plasma Chemistry & Plasma Processing 37, no. 5 (2017): 1293. https://doi.org/10.1007/s11090-017-9832-8.
MLA (9th ed.) CitationHe, Wenting, et al. "Excitation Temperature and Constituent Concentration Profiles of the Plasma Jet Under Plasma Spray-PVD Conditions." Plasma Chemistry & Plasma Processing, vol. 37, no. 5, 2017, p. 1293, https://doi.org/10.1007/s11090-017-9832-8.