Numerical Simulation of Metal Vapour Behavior in Double Electrodes TIG Welding.
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| Title: | Numerical Simulation of Metal Vapour Behavior in Double Electrodes TIG Welding. |
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| Authors: | Wang, X.1,2, wang@cqut.edu.cn, Luo, Y.1,2, Wu, G.1,2, Chi, L.1,2, Fan, D.3,4 |
| Source: | Plasma Chemistry & Plasma Processing; Sep2018, Vol. 38 Issue 5, p1095-1114, 20p |
| Database: | Applied Science & Technology Source |
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| FullText | Links: – Type: pdflink Text: Availability: 1 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 130896727 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Numerical Simulation of Metal Vapour Behavior in Double Electrodes TIG Welding. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AU" term="%22Wang%2C+X%2E%22">Wang, X.</searchLink><relatesTo>1,2</relatesTo>, <i>wang@cqut.edu.cn</i><br /><searchLink fieldCode="AU" term="%22Luo%2C+Y%2E%22">Luo, Y.</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AU" term="%22Wu%2C+G%2E%22">Wu, G.</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AU" term="%22Chi%2C+L%2E%22">Chi, L.</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AU" term="%22Fan%2C+D%2E%22">Fan, D.</searchLink><relatesTo>3,4</relatesTo> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Plasma+Chemistry+%26+Plasma+Processing%22">Plasma Chemistry & Plasma Processing</searchLink>; Sep2018, Vol. 38 Issue 5, p1095-1114, 20p |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=130896727 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1007/s11090-018-9904-4 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 20 StartPage: 1095 Titles: – TitleFull: Numerical Simulation of Metal Vapour Behavior in Double Electrodes TIG Welding. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Wang, X. – PersonEntity: Name: NameFull: Luo, Y. – PersonEntity: Name: NameFull: Wu, G. – PersonEntity: Name: NameFull: Chi, L. – PersonEntity: Name: NameFull: Fan, D. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 09 Text: Sep2018 Type: published Y: 2018 Identifiers: – Type: issn-print Value: 02724324 Numbering: – Type: volume Value: 38 – Type: issue Value: 5 Titles: – TitleFull: Plasma Chemistry & Plasma Processing Type: main |
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