Saini, S., Mele, P., Osugi, S., & Adam, M. I. (2018). Effect of Oxygen Pressure on Thermoelectric Properties of p-Type CuAlO2 Films Fabricated by Pulsed Laser Deposition. Journal of Materials Engineering & Performance, 27(12), 6286. https://doi.org/10.1007/s11665-018-3601-6
Chicago Style (17th ed.) CitationSaini, Shrikant, Paolo Mele, Shunsuke Osugi, and Malik I. Adam. "Effect of Oxygen Pressure on Thermoelectric Properties of P-Type CuAlO2 Films Fabricated by Pulsed Laser Deposition." Journal of Materials Engineering & Performance 27, no. 12 (2018): 6286. https://doi.org/10.1007/s11665-018-3601-6.
MLA (9th ed.) CitationSaini, Shrikant, et al. "Effect of Oxygen Pressure on Thermoelectric Properties of P-Type CuAlO2 Films Fabricated by Pulsed Laser Deposition." Journal of Materials Engineering & Performance, vol. 27, no. 12, 2018, p. 6286, https://doi.org/10.1007/s11665-018-3601-6.