Synergistic Effect of Plasma Discharge and Substrate Temperature in Improving the Crystallization of TiO2 Film by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition. - Xu, Yu; Zhang, Yu; Li, Linjun; Ding, Ke; Guo, Ying; Shi, Jianjun; Huang, Xiaojiang; Zhang, Jing (Plasma Chemistry & Plasma Processing, 2019)