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Leakage current lowering and film densification of ZrO2 high-k gate dielectrics by layer-by-layer, in-situ atomic layer hydrogen bombardment.

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Title: Leakage current lowering and film densification of ZrO2 high-k gate dielectrics by layer-by-layer, in-situ atomic layer hydrogen bombardment.
Authors: Huang, Kuei-Wen1, Chang, Teng-Jan1, Wang, Chun-Yuan1, Yi, Sheng-Han1, Wang, Chin-I.1, Jiang, Yu-Sen1, Yin, Yu-Tung1, Lin, Hsin-Chih1, hclinntu@ntu.edu.tw, Chen, Miin-Jang1, mjchen@ntu.edu.tw
Source: Materials Science in Semiconductor Processing; Apr2020, Vol. 109, pN.PAG-N.PAG, 1p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 141684069
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Leakage current lowering and film densification of ZrO2 high-k gate dielectrics by layer-by-layer, in-situ atomic layer hydrogen bombardment.
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  Data: <searchLink fieldCode="AU" term="%22Huang%2C+Kuei-Wen%22">Huang, Kuei-Wen</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Chang%2C+Teng-Jan%22">Chang, Teng-Jan</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Wang%2C+Chun-Yuan%22">Wang, Chun-Yuan</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Yi%2C+Sheng-Han%22">Yi, Sheng-Han</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Wang%2C+Chin-I%2E%22">Wang, Chin-I.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Jiang%2C+Yu-Sen%22">Jiang, Yu-Sen</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Yin%2C+Yu-Tung%22">Yin, Yu-Tung</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Lin%2C+Hsin-Chih%22">Lin, Hsin-Chih</searchLink><relatesTo>1</relatesTo>, <i>hclinntu@ntu.edu.tw</i><br /><searchLink fieldCode="AU" term="%22Chen%2C+Miin-Jang%22">Chen, Miin-Jang</searchLink><relatesTo>1</relatesTo>, <i>mjchen@ntu.edu.tw</i>
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  Data: <searchLink fieldCode="JN" term="%22Materials+Science+in+Semiconductor+Processing%22">Materials Science in Semiconductor Processing</searchLink>; Apr2020, Vol. 109, pN.PAG-N.PAG, 1p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=141684069
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        Value: 10.1016/j.mssp.2020.104933
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              Text: Apr2020
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