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Development of a High-Efficiency Decomposition Technology for Volatile Chemical Warfare Agent Sarin Using Dielectric Barrier Discharge.

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Title: Development of a High-Efficiency Decomposition Technology for Volatile Chemical Warfare Agent Sarin Using Dielectric Barrier Discharge.
Authors: Iwai, Takahiro1,2, Inoue, Hiroki3, Kakegawa, Ken3, Ohrui, Yasuhiko4,5, Nagoya, Tomoki4,6, Nagashima, Hisayuki4,5, Miyahara, Hidekazu7, Chiba, Koichi1, Seto, Yasuo2,4, seto.y@spring8.or.jp, Okino, Akitoshi3, aokino@es.titech.ac.jp
Source: Plasma Chemistry & Plasma Processing; Jul2020, Vol. 40 Issue 4, p907-920, 14p
Database: Applied Science & Technology Source
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  Data: Development of a High-Efficiency Decomposition Technology for Volatile Chemical Warfare Agent Sarin Using Dielectric Barrier Discharge.
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  Data: <searchLink fieldCode="AU" term="%22Iwai%2C+Takahiro%22">Iwai, Takahiro</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AU" term="%22Inoue%2C+Hiroki%22">Inoue, Hiroki</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AU" term="%22Kakegawa%2C+Ken%22">Kakegawa, Ken</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AU" term="%22Ohrui%2C+Yasuhiko%22">Ohrui, Yasuhiko</searchLink><relatesTo>4,5</relatesTo><br /><searchLink fieldCode="AU" term="%22Nagoya%2C+Tomoki%22">Nagoya, Tomoki</searchLink><relatesTo>4,6</relatesTo><br /><searchLink fieldCode="AU" term="%22Nagashima%2C+Hisayuki%22">Nagashima, Hisayuki</searchLink><relatesTo>4,5</relatesTo><br /><searchLink fieldCode="AU" term="%22Miyahara%2C+Hidekazu%22">Miyahara, Hidekazu</searchLink><relatesTo>7</relatesTo><br /><searchLink fieldCode="AU" term="%22Chiba%2C+Koichi%22">Chiba, Koichi</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Seto%2C+Yasuo%22">Seto, Yasuo</searchLink><relatesTo>2,4</relatesTo>, <i>seto.y@spring8.or.jp</i><br /><searchLink fieldCode="AU" term="%22Okino%2C+Akitoshi%22">Okino, Akitoshi</searchLink><relatesTo>3</relatesTo>, <i>aokino@es.titech.ac.jp</i>
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  Data: <searchLink fieldCode="JN" term="%22Plasma+Chemistry+%26+Plasma+Processing%22">Plasma Chemistry & Plasma Processing</searchLink>; Jul2020, Vol. 40 Issue 4, p907-920, 14p
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        Value: 10.1007/s11090-020-10057-3
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              Text: Jul2020
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