Modeling of Atmospheric-Pressure Dielectric Barrier Discharges in Argon with Small Admixtures of Tetramethylsilane.
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| Title: | Modeling of Atmospheric-Pressure Dielectric Barrier Discharges in Argon with Small Admixtures of Tetramethylsilane. |
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| Authors: | Loffhagen, Detlef1, loffhagen@inp-greifswald.de, Becker, Markus M.1, Czerny, Andreas K.2,3, Klages, Claus-Peter2 |
| Source: | Plasma Chemistry & Plasma Processing; 2021, Vol. 41 Issue 1, p289-334, 46p |
| Database: | Applied Science & Technology Source |
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| FullText | Links: – Type: pdflink Text: Availability: 1 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 148113870 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Modeling of Atmospheric-Pressure Dielectric Barrier Discharges in Argon with Small Admixtures of Tetramethylsilane. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AU" term="%22Loffhagen%2C+Detlef%22">Loffhagen, Detlef</searchLink><relatesTo>1</relatesTo>, <i>loffhagen@inp-greifswald.de</i><br /><searchLink fieldCode="AU" term="%22Becker%2C+Markus+M%2E%22">Becker, Markus M.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Czerny%2C+Andreas+K%2E%22">Czerny, Andreas K.</searchLink><relatesTo>2,3</relatesTo><br /><searchLink fieldCode="AU" term="%22Klages%2C+Claus-Peter%22">Klages, Claus-Peter</searchLink><relatesTo>2</relatesTo> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Plasma+Chemistry+%26+Plasma+Processing%22">Plasma Chemistry & Plasma Processing</searchLink>; 2021, Vol. 41 Issue 1, p289-334, 46p |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=148113870 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1007/s11090-020-10121-y Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 46 StartPage: 289 Titles: – TitleFull: Modeling of Atmospheric-Pressure Dielectric Barrier Discharges in Argon with Small Admixtures of Tetramethylsilane. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Loffhagen, Detlef – PersonEntity: Name: NameFull: Becker, Markus M. – PersonEntity: Name: NameFull: Czerny, Andreas K. – PersonEntity: Name: NameFull: Klages, Claus-Peter IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 01 Text: 2021 Type: published Y: 2021 Identifiers: – Type: issn-print Value: 02724324 Numbering: – Type: volume Value: 41 – Type: issue Value: 1 Titles: – TitleFull: Plasma Chemistry & Plasma Processing Type: main |
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