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Effect of oxygen annealing temperature on properties of spatial atomic layer deposited aluminum-doped zinc oxide films.

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Title: Effect of oxygen annealing temperature on properties of spatial atomic layer deposited aluminum-doped zinc oxide films.
Authors: Hsu, Chia-Hsun1,2, Geng, Xin-Peng1, Wu, Wan-Yu3, Zhao, Ming-Jie1, Huang, Pao-Hsun2, Zhang, Xiao-Ying1, Su, Zhan-Bo1, Chen, Zi-Rong1, Lien, Shui-Yang1,3,4, sylien@xmut.edu.cn
Source: Materials Science in Semiconductor Processing; Oct2021, Vol. 133, pN.PAG-N.PAG, 1p
Database: Applied Science & Technology Source
FullText Text:
  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 151216813
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Effect of oxygen annealing temperature on properties of spatial atomic layer deposited aluminum-doped zinc oxide films.
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  Data: <searchLink fieldCode="AU" term="%22Hsu%2C+Chia-Hsun%22">Hsu, Chia-Hsun</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AU" term="%22Geng%2C+Xin-Peng%22">Geng, Xin-Peng</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Wu%2C+Wan-Yu%22">Wu, Wan-Yu</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AU" term="%22Zhao%2C+Ming-Jie%22">Zhao, Ming-Jie</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Huang%2C+Pao-Hsun%22">Huang, Pao-Hsun</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Zhang%2C+Xiao-Ying%22">Zhang, Xiao-Ying</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Su%2C+Zhan-Bo%22">Su, Zhan-Bo</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Chen%2C+Zi-Rong%22">Chen, Zi-Rong</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Lien%2C+Shui-Yang%22">Lien, Shui-Yang</searchLink><relatesTo>1,3,4</relatesTo>, <i>sylien@xmut.edu.cn</i>
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  Data: <searchLink fieldCode="JN" term="%22Materials+Science+in+Semiconductor+Processing%22">Materials Science in Semiconductor Processing</searchLink>; Oct2021, Vol. 133, pN.PAG-N.PAG, 1p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=151216813
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1016/j.mssp.2021.105929
    Languages:
      – Code: eng
        Text: English
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        PageCount: 1
        StartPage: N.PAG
    Titles:
      – TitleFull: Effect of oxygen annealing temperature on properties of spatial atomic layer deposited aluminum-doped zinc oxide films.
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            NameFull: Hsu, Chia-Hsun
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            NameFull: Geng, Xin-Peng
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            NameFull: Wu, Wan-Yu
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            NameFull: Zhao, Ming-Jie
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            NameFull: Huang, Pao-Hsun
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            NameFull: Zhang, Xiao-Ying
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            NameFull: Su, Zhan-Bo
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            NameFull: Chen, Zi-Rong
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            NameFull: Lien, Shui-Yang
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          Dates:
            – D: 01
              M: 10
              Text: Oct2021
              Type: published
              Y: 2021
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              Value: 13698001
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              Value: 133
          Titles:
            – TitleFull: Materials Science in Semiconductor Processing
              Type: main
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