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Effect of oxygen annealing temperature on properties of spatial atomic layer deposited aluminum-doped zinc oxide films.

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Bibliographic Details
Title: Effect of oxygen annealing temperature on properties of spatial atomic layer deposited aluminum-doped zinc oxide films.
Authors: Hsu, Chia-Hsun1,2, Geng, Xin-Peng1, Wu, Wan-Yu3, Zhao, Ming-Jie1, Huang, Pao-Hsun2, Zhang, Xiao-Ying1, Su, Zhan-Bo1, Chen, Zi-Rong1, Lien, Shui-Yang1,3,4, sylien@xmut.edu.cn
Source: Materials Science in Semiconductor Processing; Oct2021, Vol. 133, pN.PAG-N.PAG, 1p
Database: Applied Science & Technology Source
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