APA (7th ed.) Citation

Devaray, P., Hatta, S. F. W. M., & Wong, Y. H. (2022). An overview of conventional and new advancements in high kappa thin film deposition techniques in metal oxide semiconductor devices. Journal of Materials Science: Materials in Electronics, 33(10), 7313. https://doi.org/10.1007/s10854-022-07975-7

Chicago Style (17th ed.) Citation

Devaray, Premdass, Sharifah Fatmadiana Wan Muhammad Hatta, and Yew Hoong Wong. "An Overview of Conventional and New Advancements in High Kappa Thin Film Deposition Techniques in Metal Oxide Semiconductor Devices." Journal of Materials Science: Materials in Electronics 33, no. 10 (2022): 7313. https://doi.org/10.1007/s10854-022-07975-7.

MLA (9th ed.) Citation

Devaray, Premdass, et al. "An Overview of Conventional and New Advancements in High Kappa Thin Film Deposition Techniques in Metal Oxide Semiconductor Devices." Journal of Materials Science: Materials in Electronics, vol. 33, no. 10, 2022, p. 7313, https://doi.org/10.1007/s10854-022-07975-7.