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An overview of conventional and new advancements in high kappa thin film deposition techniques in metal oxide semiconductor devices.

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Title: An overview of conventional and new advancements in high kappa thin film deposition techniques in metal oxide semiconductor devices.
Authors: Devaray, Premdass1, Hatta, Sharifah Fatmadiana Wan Muhammad2, Wong, Yew Hoong1, yhwong@um.edu.my
Source: Journal of Materials Science: Materials in Electronics; Apr2022, Vol. 33 Issue 10, p7313-7348, 36p
Database: Applied Science & Technology Source
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PubType: Academic Journal
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  Data: An overview of conventional and new advancements in high kappa thin film deposition techniques in metal oxide semiconductor devices.
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1007/s10854-022-07975-7
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      – Code: eng
        Text: English
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        StartPage: 7313
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      – TitleFull: An overview of conventional and new advancements in high kappa thin film deposition techniques in metal oxide semiconductor devices.
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            NameFull: Devaray, Premdass
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            NameFull: Hatta, Sharifah Fatmadiana Wan Muhammad
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            NameFull: Wong, Yew Hoong
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              Text: Apr2022
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              Y: 2022
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              Value: 33
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            – TitleFull: Journal of Materials Science: Materials in Electronics
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