Zhang, M., Liu, Q., Liu, L., & Zeng, T. (2022). Proximity-Induced Magnetism in a Topological Insulator/Half-Metallic Ferromagnetic Thin Film Heterostructure. Coatings (2079-6412), 12(6), 750. https://doi.org/10.3390/coatings12060750
Chicago Style (17th ed.) CitationZhang, Min, Qiya Liu, Ligang Liu, and Tixian Zeng. "Proximity-Induced Magnetism in a Topological Insulator/Half-Metallic Ferromagnetic Thin Film Heterostructure." Coatings (2079-6412) 12, no. 6 (2022): 750. https://doi.org/10.3390/coatings12060750.
MLA (9th ed.) CitationZhang, Min, et al. "Proximity-Induced Magnetism in a Topological Insulator/Half-Metallic Ferromagnetic Thin Film Heterostructure." Coatings (2079-6412), vol. 12, no. 6, 2022, p. 750, https://doi.org/10.3390/coatings12060750.