Investigation of electrical characterization of Al/HfO2/p-Si structures in wide temperature range.
Saved in:
| Title: | Investigation of electrical characterization of Al/HfO2/p-Si structures in wide temperature range. |
|---|---|
| Authors: | Bengi, Seda1, sbengi@baskent.edu.tr, Yükseltürk, Esra2, Bülbül, M. Mahir3 |
| Source: | Journal of Materials Science: Materials in Electronics; Jan2023, Vol. 34 Issue 3, p1-9, 9p |
| Database: | Applied Science & Technology Source |
|
Full text is not displayed to guests.
Login for full access.
|
|
| ISSN: | 09574522 |
|---|---|
| DOI: | 10.1007/s10854-022-09613-8 |
