Evolution of the thermal behavior and complexity of end-of-range defects in silicon pre-amorphized by Ge+ implantation.

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Title: Evolution of the thermal behavior and complexity of end-of-range defects in silicon pre-amorphized by Ge+ implantation.
Authors: Belafhaili, Amine1, a.belafhaili@um5r.ac.ma, Laanab, Larbi2
Source: Journal of Materials Science: Materials in Electronics; Feb2023, Vol. 34 Issue 5, p1-6, 6p
Database: Applied Science & Technology Source
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DbLabel: Applied Science & Technology Source
An: 161982068
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  Data: Evolution of the thermal behavior and complexity of end-of-range defects in silicon pre-amorphized by Ge+ implantation.
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Materials+Science%3A+Materials+in+Electronics%22">Journal of Materials Science: Materials in Electronics</searchLink>; Feb2023, Vol. 34 Issue 5, p1-6, 6p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=161982068
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      – Type: doi
        Value: 10.1007/s10854-022-09794-2
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      – Code: eng
        Text: English
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        PageCount: 6
        StartPage: 1
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      – TitleFull: Evolution of the thermal behavior and complexity of end-of-range defects in silicon pre-amorphized by Ge+ implantation.
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            NameFull: Belafhaili, Amine
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            NameFull: Laanab, Larbi
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            – D: 15
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              Text: Feb2023
              Type: published
              Y: 2023
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            – TitleFull: Journal of Materials Science: Materials in Electronics
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