APA (7th ed.) Citation

Yalçın, Y., Arslan, Ö., İldeş, C., Çokduygulular, E., Çetinkaya, Ç., & Kınacı, B. (2023). Electrical and dielectric properties of RF sputtered nano Al2O3 film annealed at 400 °C. Journal of Materials Science: Materials in Electronics, 34(25), 1. https://doi.org/10.1007/s10854-023-11222-y

Chicago Style (17th ed.) Citation

Yalçın, Yeşim, Öznur Arslan, Caner İldeş, Erman Çokduygulular, Çağlar Çetinkaya, and Barış Kınacı. "Electrical and Dielectric Properties of RF Sputtered Nano Al2O3 Film Annealed at 400 °C." Journal of Materials Science: Materials in Electronics 34, no. 25 (2023): 1. https://doi.org/10.1007/s10854-023-11222-y.

MLA (9th ed.) Citation

Yalçın, Yeşim, et al. "Electrical and Dielectric Properties of RF Sputtered Nano Al2O3 Film Annealed at 400 °C." Journal of Materials Science: Materials in Electronics, vol. 34, no. 25, 2023, p. 1, https://doi.org/10.1007/s10854-023-11222-y.