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Absolute doubly differential angular sputtering yields for 20 keV Kr+ on polycrystalline Cu.

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Title: Absolute doubly differential angular sputtering yields for 20 keV Kr+ on polycrystalline Cu.
Authors: Bu, Caixia1, cb3619@columbia.edu, Morrissey, Liam S.2,3, lsm088@mun.ca, Bostick, Benjamin C.4, Burger, Matthew H.5, Bowen, Kyle P.1, Chillrud, Steven N.4, Domingue, Deborah L.6, Dukes, Catherine A.7, Ebel, Denton S.8, Harlow, George E.8, Hillenbrand, Pierre-Michel1, Ivanov, Dmitry A.1, Killen, Rosemary M.2, Ross, James M.4, Schury, Daniel1, Tucker, Orenthal J.2, Urbain, Xavier9, Zhang, Ruitian1, Savin, Daniel W.1, dws26@columbia.edu
Source: Journal of Applied Physics; 1/21/2024, Vol. 135 Issue 3, p1-9, 9p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 174910826
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Absolute doubly differential angular sputtering yields for 20 keV Kr+ on polycrystalline Cu.
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; 1/21/2024, Vol. 135 Issue 3, p1-9, 9p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=174910826
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        Value: 10.1063/5.0184417
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        Text: English
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              Text: 1/21/2024
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