Influence of magnetic field strength on plasma, microstructure, and mechanical properties of Cr thin films deposited by MPPMS and DOMS.

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Title: Influence of magnetic field strength on plasma, microstructure, and mechanical properties of Cr thin films deposited by MPPMS and DOMS.
Authors: Li, Y. G.1, ygli@dlut.edu.cn, Liu, W. Y.1, Cui, L.1
Source: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Mar2024, Vol. 42 Issue 2, p1-11, 11p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 175796189
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Influence of magnetic field strength on plasma, microstructure, and mechanical properties of Cr thin films deposited by MPPMS and DOMS.
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  Data: <searchLink fieldCode="AU" term="%22Li%2C+Y%2E+G%2E%22">Li, Y. G.</searchLink><relatesTo>1</relatesTo>, <i>ygli@dlut.edu.cn</i><br /><searchLink fieldCode="AU" term="%22Liu%2C+W%2E+Y%2E%22">Liu, W. Y.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Cui%2C+L%2E%22">Cui, L.</searchLink><relatesTo>1</relatesTo>
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PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=175796189
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1116/6.0003287
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 11
        StartPage: 1
    Titles:
      – TitleFull: Influence of magnetic field strength on plasma, microstructure, and mechanical properties of Cr thin films deposited by MPPMS and DOMS.
        Type: main
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            NameFull: Li, Y. G.
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            NameFull: Liu, W. Y.
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            NameFull: Cui, L.
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          Dates:
            – D: 01
              M: 03
              Text: Mar2024
              Type: published
              Y: 2024
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              Value: 07342101
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              Value: 42
            – Type: issue
              Value: 2
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            – TitleFull: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films
              Type: main
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