Jeske, M. P., Bonino, M. J., Huang, X., Harding, D. R., Lu, Y., & Anthamatten, M. (2024). Two‐Photon Printing of Base‐Catalyzed Resins Involving Thiol‐Michael Network Formation. Advanced Materials Technologies, 9(11), 1. https://doi.org/10.1002/admt.202400100
Chicago Style (17th ed.) CitationJeske, Madelyn P., Mark J. Bonino, Xi Huang, David R. Harding, Yongfeng Lu, and Mitchell Anthamatten. "Two‐Photon Printing of Base‐Catalyzed Resins Involving Thiol‐Michael Network Formation." Advanced Materials Technologies 9, no. 11 (2024): 1. https://doi.org/10.1002/admt.202400100.
MLA (9th ed.) CitationJeske, Madelyn P., et al. "Two‐Photon Printing of Base‐Catalyzed Resins Involving Thiol‐Michael Network Formation." Advanced Materials Technologies, vol. 9, no. 11, 2024, p. 1, https://doi.org/10.1002/admt.202400100.