Robert, R., Massines, F., & Stafford, L. (2024). Kinetics Driving H2(a) Continuum Emission in Low-Frequency Ar-NH3 Dielectric Barrier Discharges at Atmospheric Pressure. Plasma Chemistry & Plasma Processing, 44(4), 1547. https://doi.org/10.1007/s11090-024-10459-7
Chicago Style (17th ed.) CitationRobert, Raphaël, Françoise Massines, and Luc Stafford. "Kinetics Driving H2(a) Continuum Emission in Low-Frequency Ar-NH3 Dielectric Barrier Discharges at Atmospheric Pressure." Plasma Chemistry & Plasma Processing 44, no. 4 (2024): 1547. https://doi.org/10.1007/s11090-024-10459-7.
MLA (9th ed.) CitationRobert, Raphaël, et al. "Kinetics Driving H2(a) Continuum Emission in Low-Frequency Ar-NH3 Dielectric Barrier Discharges at Atmospheric Pressure." Plasma Chemistry & Plasma Processing, vol. 44, no. 4, 2024, p. 1547, https://doi.org/10.1007/s11090-024-10459-7.