POSS and PAG Dual-Containing Chemically Amplified Photoresists by RAFT Polymerization for Enhanced Thermal Performance and Acid Diffusion Inhibition. - Yu, Haimeng; Liu, Shaoshuai; Fu, Haiyan; Cui, Zepeng; Zhang, Liangshun; Tian, Jia (Applied Sciences (2076-3417), 2024)