APA (7th ed.) Citation

Lee, S., Han, S., Kim, J., Jeon, M., & Chae, H. (2024). Etch Rate Uniformity Monitoring for Photoresist Etch Using Multi-channel Optical Emission Spectroscopy and Scanning Floating Harmonic Probe in an Inductively Coupled Plasma Reactor. Plasma Chemistry & Plasma Processing, 44(6), 2247. https://doi.org/10.1007/s11090-024-10498-0

Chicago Style (17th ed.) Citation

Lee, Sanghun, Sanghee Han, Jaehyeon Kim, Minsung Jeon, and Heeyeop Chae. "Etch Rate Uniformity Monitoring for Photoresist Etch Using Multi-channel Optical Emission Spectroscopy and Scanning Floating Harmonic Probe in an Inductively Coupled Plasma Reactor." Plasma Chemistry & Plasma Processing 44, no. 6 (2024): 2247. https://doi.org/10.1007/s11090-024-10498-0.

MLA (9th ed.) Citation

Lee, Sanghun, et al. "Etch Rate Uniformity Monitoring for Photoresist Etch Using Multi-channel Optical Emission Spectroscopy and Scanning Floating Harmonic Probe in an Inductively Coupled Plasma Reactor." Plasma Chemistry & Plasma Processing, vol. 44, no. 6, 2024, p. 2247, https://doi.org/10.1007/s11090-024-10498-0.