View in EDS HTML Full Text PDF Full Text

Etch Rate Uniformity Monitoring for Photoresist Etch Using Multi-channel Optical Emission Spectroscopy and Scanning Floating Harmonic Probe in an Inductively Coupled Plasma Reactor.

Saved in:

Bibliographic Details
Title:	Etch Rate Uniformity Monitoring for Photoresist Etch Using Multi-channel Optical Emission Spectroscopy and Scanning Floating Harmonic Probe in an Inductively Coupled Plasma Reactor.
Authors:	Lee, Sanghun¹, Han, Sanghee¹, Kim, Jaehyeon¹, Jeon, Minsung², Chae, Heeyeop^1,2, hchae@skku.edu
Source:	Plasma Chemistry & Plasma Processing; Nov2024, Vol. 44 Issue 6, p2247-2262, 16p
Database:	Applied Science & Technology Source
Full text is not displayed to guests. Login for full access.

Description
ISSN:	02724324
DOI:	10.1007/s11090-024-10498-0