Etch Rate Uniformity Monitoring for Photoresist Etch Using Multi-channel Optical Emission Spectroscopy and Scanning Floating Harmonic Probe in an Inductively Coupled Plasma Reactor. - Lee, Sanghun; Han, Sanghee; Kim, Jaehyeon; Jeon, Minsung; Chae, Heeyeop (Plasma Chemistry & Plasma Processing, 2024)