APA (7th ed.) Citation

Gu, Y., Li, J., Wang, D., & Zhang, N. (2025). Effect of Nitrogen Ratio in Sputtering on the Quality of Film Formation and Electron Emission Properties of Nitride Films. Coatings (2079-6412), 15(1), 55. https://doi.org/10.3390/coatings15010055

Chicago Style (17th ed.) Citation

Gu, Yuqing, Juannan Li, Dan Wang, and Na Zhang. "Effect of Nitrogen Ratio in Sputtering on the Quality of Film Formation and Electron Emission Properties of Nitride Films." Coatings (2079-6412) 15, no. 1 (2025): 55. https://doi.org/10.3390/coatings15010055.

MLA (9th ed.) Citation

Gu, Yuqing, et al. "Effect of Nitrogen Ratio in Sputtering on the Quality of Film Formation and Electron Emission Properties of Nitride Films." Coatings (2079-6412), vol. 15, no. 1, 2025, p. 55, https://doi.org/10.3390/coatings15010055.