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Effect of Nitrogen Ratio in Sputtering on the Quality of Film Formation and Electron Emission Properties of Nitride Films.

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Bibliographic Details
Title: Effect of Nitrogen Ratio in Sputtering on the Quality of Film Formation and Electron Emission Properties of Nitride Films.
Authors: Gu, Yuqing1, jameslee@uestc.edu.cn, Li, Juannan1, Wang, Dan2, alexaustin@xjtu.edu.cn, Zhang, Na3
Source: Coatings (2079-6412); Jan2025, Vol. 15 Issue 1, p55, 12p
Database: Applied Science & Technology Source
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ISSN:20796412
DOI:10.3390/coatings15010055