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Methods for automatically obtaining the sputtering-induced roughness upon depth profiling of polycrystalline films.

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Title: Methods for automatically obtaining the sputtering-induced roughness upon depth profiling of polycrystalline films.
Authors: Liu, Gong-Wen1, Ye, Jin-Peng2, Tan, Zhi-Rou1, Lian, Song-You1,3, sylian1@stu.edu.cn, Yan, Xin-Liang4, xlyan@gdmu.edu.cn, Wang, Jiang-Yong1,3
Source: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Mar2025, Vol. 43 Issue 2, p1-9, 9p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 183942830
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Methods for automatically obtaining the sputtering-induced roughness upon depth profiling of polycrystalline films.
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1116/6.0004323
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      – Code: eng
        Text: English
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        PageCount: 9
        StartPage: 1
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      – TitleFull: Methods for automatically obtaining the sputtering-induced roughness upon depth profiling of polycrystalline films.
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            NameFull: Liu, Gong-Wen
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            NameFull: Ye, Jin-Peng
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            NameFull: Tan, Zhi-Rou
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            NameFull: Lian, Song-You
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            NameFull: Yan, Xin-Liang
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            NameFull: Wang, Jiang-Yong
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            – D: 01
              M: 03
              Text: Mar2025
              Type: published
              Y: 2025
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              Value: 43
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            – TitleFull: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics
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