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Improving the Lithography Sensitivity of Atomically Precise Tin‐Oxo Nanoclusters via Heterometal Strategy.

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Title: Improving the Lithography Sensitivity of Atomically Precise Tin‐Oxo Nanoclusters via Heterometal Strategy.
Authors: Chen, Weizhou1,2, Wang, Liming3, Wang, Zi‐Rui1, Zhu, Tao3,4, Ye, Yuting1,2, Li, Qiao‐Hong1, Yi, Xiaofeng1, xfyi@fjirsm.ac.cn, Zhang, Jian1, zhj@fjirsm.ac.cn
Source: Angewandte Chemie International Edition; 1/10/2025, Vol. 64 Issue 2, p1-9, 9p
Database: Applied Science & Technology Source
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DbLabel: Applied Science & Technology Source
An: 183984625
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  Data: <searchLink fieldCode="JN" term="%22Angewandte+Chemie+International+Edition%22">Angewandte Chemie International Edition</searchLink>; 1/10/2025, Vol. 64 Issue 2, p1-9, 9p
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        Value: 10.1002/anie.202414360
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        Text: English
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      – TitleFull: Improving the Lithography Sensitivity of Atomically Precise Tin‐Oxo Nanoclusters via Heterometal Strategy.
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              Text: 1/10/2025
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