Improving the Lithography Sensitivity of Atomically Precise Tin‐Oxo Nanoclusters via Heterometal Strategy.
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| Title: | Improving the Lithography Sensitivity of Atomically Precise Tin‐Oxo Nanoclusters via Heterometal Strategy. |
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| Authors: | Chen, Weizhou1,2, Wang, Liming3, Wang, Zi‐Rui1, Zhu, Tao3,4, Ye, Yuting1,2, Li, Qiao‐Hong1, Yi, Xiaofeng1, xfyi@fjirsm.ac.cn, Zhang, Jian1, zhj@fjirsm.ac.cn |
| Source: | Angewandte Chemie International Edition; 1/10/2025, Vol. 64 Issue 2, p1-9, 9p |
| Database: | Applied Science & Technology Source |
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