APA (7th ed.) Citation

Butnyakov, D. A., Sorokin, I. A., & Kolodko, D. V. (2025). Diffusion Transport of Target Material for a Planar Asymmetrical Hollow Cathode Sputtering System. Plasma Chemistry & Plasma Processing, 45(3), 1029. https://doi.org/10.1007/s11090-025-10550-7

Chicago Style (17th ed.) Citation

Butnyakov, D. A., I. A. Sorokin, and D. V. Kolodko. "Diffusion Transport of Target Material for a Planar Asymmetrical Hollow Cathode Sputtering System." Plasma Chemistry & Plasma Processing 45, no. 3 (2025): 1029. https://doi.org/10.1007/s11090-025-10550-7.

MLA (9th ed.) Citation

Butnyakov, D. A., et al. "Diffusion Transport of Target Material for a Planar Asymmetrical Hollow Cathode Sputtering System." Plasma Chemistry & Plasma Processing, vol. 45, no. 3, 2025, p. 1029, https://doi.org/10.1007/s11090-025-10550-7.