Diffusion Transport of Target Material for a Planar Asymmetrical Hollow Cathode Sputtering System.
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| Title: | Diffusion Transport of Target Material for a Planar Asymmetrical Hollow Cathode Sputtering System. |
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| Authors: | Butnyakov, D. A.1, butnyakovda@yandex.ru, Sorokin, I. A.1,2, iasorokin@mail.ru, Kolodko, D. V.1,2, dobrynya_kol@mail.ru |
| Source: | Plasma Chemistry & Plasma Processing; May2025, Vol. 45 Issue 3, p1029-1044, 16p |
| Database: | Applied Science & Technology Source |
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| FullText | Links: – Type: pdflink Text: Availability: 1 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 184325037 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=184325037 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1007/s11090-025-10550-7 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 16 StartPage: 1029 Titles: – TitleFull: Diffusion Transport of Target Material for a Planar Asymmetrical Hollow Cathode Sputtering System. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Butnyakov, D. A. – PersonEntity: Name: NameFull: Sorokin, I. A. – PersonEntity: Name: NameFull: Kolodko, D. V. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 05 Text: May2025 Type: published Y: 2025 Identifiers: – Type: issn-print Value: 02724324 Numbering: – Type: volume Value: 45 – Type: issue Value: 3 Titles: – TitleFull: Plasma Chemistry & Plasma Processing Type: main |
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