Diffusion Transport of Target Material for a Planar Asymmetrical Hollow Cathode Sputtering System.
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| Title: | Diffusion Transport of Target Material for a Planar Asymmetrical Hollow Cathode Sputtering System. |
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| Authors: | Butnyakov, D. A.1, butnyakovda@yandex.ru, Sorokin, I. A.1,2, iasorokin@mail.ru, Kolodko, D. V.1,2, dobrynya_kol@mail.ru |
| Source: | Plasma Chemistry & Plasma Processing; May2025, Vol. 45 Issue 3, p1029-1044, 16p |
| Database: | Applied Science & Technology Source |
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