APA (7th ed.) Citation

Powell, E., Nagesha, M., Manley, R. G., Zhu, B., & Hirschman, K. D. (2025). Thermally Dependent Metastability of Indium-Tungsten-Oxide Thin-Film Transistors. Journal of Electronic Materials, 54(6), 4319. https://doi.org/10.1007/s11664-025-11770-5

Chicago Style (17th ed.) Citation

Powell, Eli, Meghana Nagesha, Robert G. Manley, Bin Zhu, and Karl D. Hirschman. "Thermally Dependent Metastability of Indium-Tungsten-Oxide Thin-Film Transistors." Journal of Electronic Materials 54, no. 6 (2025): 4319. https://doi.org/10.1007/s11664-025-11770-5.

MLA (9th ed.) Citation

Powell, Eli, et al. "Thermally Dependent Metastability of Indium-Tungsten-Oxide Thin-Film Transistors." Journal of Electronic Materials, vol. 54, no. 6, 2025, p. 4319, https://doi.org/10.1007/s11664-025-11770-5.