Proximity effect correction in electron beam lithography using a composite function model of electron scattering energy distribution.
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| Title: | Proximity effect correction in electron beam lithography using a composite function model of electron scattering energy distribution. |
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| Authors: | Mao, Qingyuan1,2,3, Zhu, Jingyuan1,2,3, 24068@tongji.edu.cn, Cheng, Xinbin1,2,3,4, chengxb@tongji.edu.cn, Wang, Zhanshan1,2,3,4 |
| Source: | Discover Nano; 5/19/2025, Vol. 20 Issue 1, p1-10, 10p |
| Database: | Applied Science & Technology Source |
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| ISSN: | 27319229 |
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| DOI: | 10.1186/s11671-025-04264-0 |
