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Proximity effect correction in electron beam lithography using a composite function model of electron scattering energy distribution.

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Title: Proximity effect correction in electron beam lithography using a composite function model of electron scattering energy distribution.
Authors: Mao, Qingyuan1,2,3, Zhu, Jingyuan1,2,3, 24068@tongji.edu.cn, Cheng, Xinbin1,2,3,4, chengxb@tongji.edu.cn, Wang, Zhanshan1,2,3,4
Source: Discover Nano; 5/19/2025, Vol. 20 Issue 1, p1-10, 10p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 185282043
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Proximity effect correction in electron beam lithography using a composite function model of electron scattering energy distribution.
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  Data: <searchLink fieldCode="AU" term="%22Mao%2C+Qingyuan%22">Mao, Qingyuan</searchLink><relatesTo>1,2,3</relatesTo><br /><searchLink fieldCode="AU" term="%22Zhu%2C+Jingyuan%22">Zhu, Jingyuan</searchLink><relatesTo>1,2,3</relatesTo>, <i>24068@tongji.edu.cn</i><br /><searchLink fieldCode="AU" term="%22Cheng%2C+Xinbin%22">Cheng, Xinbin</searchLink><relatesTo>1,2,3,4</relatesTo>, <i>chengxb@tongji.edu.cn</i><br /><searchLink fieldCode="AU" term="%22Wang%2C+Zhanshan%22">Wang, Zhanshan</searchLink><relatesTo>1,2,3,4</relatesTo>
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  Data: <searchLink fieldCode="JN" term="%22Discover+Nano%22">Discover Nano</searchLink>; 5/19/2025, Vol. 20 Issue 1, p1-10, 10p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=185282043
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1186/s11671-025-04264-0
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      – Code: eng
        Text: English
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      – TitleFull: Proximity effect correction in electron beam lithography using a composite function model of electron scattering energy distribution.
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            NameFull: Zhu, Jingyuan
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              Text: 5/19/2025
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              Y: 2025
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              Value: 20
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