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Role of Oxygen Concentration in Reactive Sputtering of RuO 2 Thin Films: Tuning Surface Chemistry for Enhanced Electrocatalytic Performance.

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Title: Role of Oxygen Concentration in Reactive Sputtering of RuO 2 Thin Films: Tuning Surface Chemistry for Enhanced Electrocatalytic Performance.
Authors: Nalawade, Swapnil1, Vondee, Ebenezer1,2, Liu, Mengxin1,2, Chris-Okoro, Ikenna2, Cherono, Sheilah2, Kumar, Dhananjay2, Aravamudhan, Shyam1, saravamu@ncat.edu
Source: Crystals (2073-4352); May2025, Vol. 15 Issue 5, p417, 16p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 185473893
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Role of Oxygen Concentration in Reactive Sputtering of RuO 2 Thin Films: Tuning Surface Chemistry for Enhanced Electrocatalytic Performance.
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PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=185473893
RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.3390/cryst15050417
    Languages:
      – Code: eng
        Text: English
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      Pagination:
        PageCount: 16
        StartPage: 417
    Titles:
      – TitleFull: Role of Oxygen Concentration in Reactive Sputtering of RuO 2 Thin Films: Tuning Surface Chemistry for Enhanced Electrocatalytic Performance.
        Type: main
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          Name:
            NameFull: Nalawade, Swapnil
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            NameFull: Vondee, Ebenezer
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            NameFull: Liu, Mengxin
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            NameFull: Chris-Okoro, Ikenna
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            NameFull: Cherono, Sheilah
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            NameFull: Kumar, Dhananjay
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            NameFull: Aravamudhan, Shyam
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          Dates:
            – D: 01
              M: 05
              Text: May2025
              Type: published
              Y: 2025
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              Value: 5
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            – TitleFull: Crystals (2073-4352)
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