Winburn, M. R., Schuelke, K. L., Miller, A. L., Chowdhury, P., Du, L., & Cheung, C. L. (2025). Stimulated Production of Heat Stable Antifungal Factor by Plasma-Activated Water. Plasma Chemistry & Plasma Processing, 45(5), 1533. https://doi.org/10.1007/s11090-025-10581-0
Chicago Style (17th ed.) CitationWinburn, Matthew R., Kyle L. Schuelke, Amanda Lynn Miller, Pinky Chowdhury, Liangcheng Du, and Chin Li Cheung. "Stimulated Production of Heat Stable Antifungal Factor by Plasma-Activated Water." Plasma Chemistry & Plasma Processing 45, no. 5 (2025): 1533. https://doi.org/10.1007/s11090-025-10581-0.
MLA (9th ed.) CitationWinburn, Matthew R., et al. "Stimulated Production of Heat Stable Antifungal Factor by Plasma-Activated Water." Plasma Chemistry & Plasma Processing, vol. 45, no. 5, 2025, p. 1533, https://doi.org/10.1007/s11090-025-10581-0.