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Scalable Chemical Vapor Deposition of Silicon Carbide Thin Films for Photonic Integrated Circuit Applications.

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Bibliographic Details
Title:	Scalable Chemical Vapor Deposition of Silicon Carbide Thin Films for Photonic Integrated Circuit Applications.
Authors:	Dutta, Souryaya¹, Kaloyeros, Alex¹, Nanaware, Animesh¹, Gallis, Spyros¹, sgalis@albany.edu
Source:	Applied Sciences (2076-3417); Aug2025, Vol. 15 Issue 15, p8603, 16p
Database:	Applied Science & Technology Source
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Description
ISSN:	20763417
DOI:	10.3390/app15158603