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Scalable Chemical Vapor Deposition of Silicon Carbide Thin Films for Photonic Integrated Circuit Applications.

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Title: Scalable Chemical Vapor Deposition of Silicon Carbide Thin Films for Photonic Integrated Circuit Applications.
Authors: Dutta, Souryaya1, Kaloyeros, Alex1, Nanaware, Animesh1, Gallis, Spyros1, sgalis@albany.edu
Source: Applied Sciences (2076-3417); Aug2025, Vol. 15 Issue 15, p8603, 16p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 187318407
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PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Scalable Chemical Vapor Deposition of Silicon Carbide Thin Films for Photonic Integrated Circuit Applications.
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        Value: 10.3390/app15158603
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      – Code: eng
        Text: English
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        PageCount: 16
        StartPage: 8603
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      – TitleFull: Scalable Chemical Vapor Deposition of Silicon Carbide Thin Films for Photonic Integrated Circuit Applications.
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            NameFull: Dutta, Souryaya
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            NameFull: Kaloyeros, Alex
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              Text: Aug2025
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              Y: 2025
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