APA (7th ed.) Citation

Kim, Y., Choi, S., Oh, H., Hwang, T., & Park, J. (2025). 70‐1: Invited Paper: Challenges of Atomic‐Layer‐Deposited Oxide Semiconductor Channels beyond PVD: Material, Devices, and M3D Stacked Structures. SID Symposium Digest of Technical Papers, 56(1), 946. https://doi.org/10.1002/sdtp.18327

Chicago Style (17th ed.) Citation

Kim, Yoon-Seo, Su-Hwan Choi, Hyejin Oh, Taewon Hwang, and Jin-Seong Park. "70‐1: Invited Paper: Challenges of Atomic‐Layer‐Deposited Oxide Semiconductor Channels Beyond PVD: Material, Devices, and M3D Stacked Structures." SID Symposium Digest of Technical Papers 56, no. 1 (2025): 946. https://doi.org/10.1002/sdtp.18327.

MLA (9th ed.) Citation

Kim, Yoon-Seo, et al. "70‐1: Invited Paper: Challenges of Atomic‐Layer‐Deposited Oxide Semiconductor Channels Beyond PVD: Material, Devices, and M3D Stacked Structures." SID Symposium Digest of Technical Papers, vol. 56, no. 1, 2025, p. 946, https://doi.org/10.1002/sdtp.18327.