APA (7th ed.) Citation

Chen, J., Wang, Y., Huang, T., Ji, P., & Wu, X. (2025). Plasma Controlled Growth Dynamics and Electrical Properties of Ag Nanofilms via RF Magnetron Sputtering. Coatings (2079-6412), 15(9), 1062. https://doi.org/10.3390/coatings15091062

Chicago Style (17th ed.) Citation

Chen, Jiali, Yanyan Wang, Tianyuan Huang, Peiyu Ji, and Xuemei Wu. "Plasma Controlled Growth Dynamics and Electrical Properties of Ag Nanofilms via RF Magnetron Sputtering." Coatings (2079-6412) 15, no. 9 (2025): 1062. https://doi.org/10.3390/coatings15091062.

MLA (9th ed.) Citation

Chen, Jiali, et al. "Plasma Controlled Growth Dynamics and Electrical Properties of Ag Nanofilms via RF Magnetron Sputtering." Coatings (2079-6412), vol. 15, no. 9, 2025, p. 1062, https://doi.org/10.3390/coatings15091062.