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Plasma Controlled Growth Dynamics and Electrical Properties of Ag Nanofilms via RF Magnetron Sputtering.

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Title: Plasma Controlled Growth Dynamics and Electrical Properties of Ag Nanofilms via RF Magnetron Sputtering.
Authors: Chen, Jiali1,2, Wang, Yanyan1,2, Huang, Tianyuan3, Ji, Peiyu4, cjl@szcu.edu.cn, Wu, Xuemei1,3
Source: Coatings (2079-6412); Sep2025, Vol. 15 Issue 9, p1062, 13p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 188280999
AccessLevel: 2
PubType: Academic Journal
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  Data: Plasma Controlled Growth Dynamics and Electrical Properties of Ag Nanofilms via RF Magnetron Sputtering.
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  Data: <searchLink fieldCode="JN" term="%22Coatings+%282079-6412%29%22">Coatings (2079-6412)</searchLink>; Sep2025, Vol. 15 Issue 9, p1062, 13p
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RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.3390/coatings15091062
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      – Code: eng
        Text: English
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        PageCount: 13
        StartPage: 1062
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      – TitleFull: Plasma Controlled Growth Dynamics and Electrical Properties of Ag Nanofilms via RF Magnetron Sputtering.
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            NameFull: Chen, Jiali
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            NameFull: Wang, Yanyan
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            NameFull: Huang, Tianyuan
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            NameFull: Ji, Peiyu
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            – D: 01
              M: 09
              Text: Sep2025
              Type: published
              Y: 2025
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              Value: 20796412
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              Value: 15
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              Value: 9
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