Water-Developable PFAS-Free Glycan-Derived Positive Photoresist Materials for Environmentally Friendly Lithography. - Hachikubo, Yuna; Hayashi, Hiryu; Ando, Mano; Morita, Mayu; Oshima, Misaki; Hashim, Abdul Manaf; Azhan, Nurul Hanis; Ota, Takayuki; Takei, Satoshi (Coatings (2079-6412), 2025)