APA (7th ed.) Citation

Shin, D., Son, Y., & Kam, T. (2025). Sharpness-aware minimization with physics-informed regularizations for predicting semiconductor material properties in molecular dynamics. Chemometrics & Intelligent Laboratory Systems, 267, N.PAG. https://doi.org/10.1016/j.chemolab.2025.105511

Chicago Style (17th ed.) Citation

Shin, Dong-Hee, Young-Han Son, and Tae-Eui Kam. "Sharpness-aware Minimization with Physics-informed Regularizations for Predicting Semiconductor Material Properties in Molecular Dynamics." Chemometrics & Intelligent Laboratory Systems 267 (2025): N.PAG. https://doi.org/10.1016/j.chemolab.2025.105511.

MLA (9th ed.) Citation

Shin, Dong-Hee, et al. "Sharpness-aware Minimization with Physics-informed Regularizations for Predicting Semiconductor Material Properties in Molecular Dynamics." Chemometrics & Intelligent Laboratory Systems, vol. 267, 2025, p. N.PAG, https://doi.org/10.1016/j.chemolab.2025.105511.